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Main · CIQTEK equipment · Scanning electron microscopes CIQTEK ·
Focused Ion Beam Scanning Electron Microscope CIQTEK DB550 (FIB-SEM)
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Focused Ion Beam Scanning Electron Microscope CIQTEK DB550 (FIB-SEM)
Focused Ion Beam Scanning Electron Microscope CIQTEK DB550 (FIB-SEM)
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Focused Ion Beam Scanning Electron Microscope CIQTEK DB550 (FIB-SEM)

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Field emission scanning electron microscope (FE-SEM) with focused ion beam (FIB) columns

CIQTEK DB550 focused ion beam scanning electron microscope (FIB-SEM) is equipped with a focused ion beam column for nanoanalysis and sample preparation. It uses the technology of "supertunnel" electron optics, low aberration and non-magnetic lens design, and also has the function of "low voltage, high resolution", providing it with nanoscale analytical capabilities.

Ion columns make it possible to use a source of liquid metal ions Ga+ with highly stable and high-quality ion beams, which provides opportunities for nanoproduction. The DB550 is a universal workstation for nanoanalysis and production with a built-in nanomanipulator, gas injection system and convenient software with a graphical user interface.

Function:
Technology "Supertunnel" column electron optics/beam retardation inside the column
Reducing the effect of spatial charging, providing resolution at low voltage.

Absence of intersections on the path of the electron beam
Effectively reduce lens aberrations and improve resolution.

Electromagnetic and electrostatic composite lens
Reduce aberrations, significantly improve resolution at low voltages, and provide the ability to observe magnetic samples.

Lens with constant temperature and water cooling
Ensure stability, reliability and repeatability of lens characteristics.

Variable aperture switching system with several holes due to electromagnetic deflection of the beam
Automatic switching between apertures without mechanical movement allows you to quickly switch between different visualization modes.

Technical characteristics:
Focused ion beam (FIB) column
Resolution: 3 nm at 30 kV
Current sensor: from 1 pA to 65 nA
Range of accelerating voltage: from 0.5 to 30 kV
Interval of ion source replacement: ≥1000 hours
Stability: 72 hours of continuous operation

Nanomanipulator
Internally mounted camera
Three-axis fully piezoelectric drive
The accuracy of the stepper motor is ≤10 nm
The maximum speed of movement is 2 mm/s
Built-in control system

Joint work of the ion-electron beam

Gas injection system
Unified project KRUE
Various sources of gas precursors are available
The distance of the injection needle is ≥35 mm
Repeatability of movement ≤10 μm
Repeatability of heating temperature control ≤0.1°C
Heating range: from room temperature to 90°C (194°F)
Built-in control system
Kazakhstan, Semey city, Fizkulturnaya street, 4a
+7 (778) 576-15-75
info@okb.kz